High-NA EUV

A lithography tool whose wider optics print finer circuits in a single pass than standard EUV. It can cut the number of printing passes and so improve both cost and output, but each machine is far more expensive than a standard EUV tool and the process around it has to be re-tuned, which is why Intel, Samsung and TSMC differ on when to adopt it.

Predictions & track record (2)

• Awaiting grading Samsung already bought the tools, and then said it would use them in 2030Score on whether the first Samsung process to run High-NA EUV in volume is A10 or a node above it.
• Awaiting grading Intel just locked in a 2028 chip timeline, a year ahead of what Wall Street had priced inFinal confirmation (2028 mass production) is far off, so this checks an interim signal. At Intel's Q3 2026 earnings (expected around Oct 23), check whether the 14A internal-product risk-production guidance is reaffirmed, and whether the H2 2027 timeline has shifted. Actual risk-production start is re-checked in H2 2027.

2 related posts

• Watch Samsung already bought the tools, and then said it would use them in 2030 Jukan (@jukan05) · 2026-08-11
• Bull Intel just locked in a 2028 chip timeline, a year ahead of what Wall Street had priced in Jukan (@jukan05) · 2026-07-23